JPS61220260A - 電子顕微鏡 - Google Patents

電子顕微鏡

Info

Publication number
JPS61220260A
JPS61220260A JP61032068A JP3206886A JPS61220260A JP S61220260 A JPS61220260 A JP S61220260A JP 61032068 A JP61032068 A JP 61032068A JP 3206886 A JP3206886 A JP 3206886A JP S61220260 A JPS61220260 A JP S61220260A
Authority
JP
Japan
Prior art keywords
electron
electrons
specimen
scanning
low
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61032068A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0453070B2 (en]
Inventor
デービツド・アンソニー・スミス
オリバー・クレイグ・ウエルズ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of JPS61220260A publication Critical patent/JPS61220260A/ja
Publication of JPH0453070B2 publication Critical patent/JPH0453070B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02Details
    • H01J2237/024Moving components not otherwise provided for
    • H01J2237/0245Moving whole optical system relatively to object
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • H01J2237/1502Mechanical adjustments
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15Means for deflecting or directing discharge
    • H01J2237/1502Mechanical adjustments
    • H01J2237/1503Mechanical scanning
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25Tubes for localised analysis using electron or ion beams
    • H01J2237/2505Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2583Tubes for localised analysis using electron or ion beams characterised by their application using tunnel effects, e.g. STM, AFM
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/28Scanning microscopes
    • H01J2237/2802Transmission microscopes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/852Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/84Manufacture, treatment, or detection of nanostructure
    • Y10S977/849Manufacture, treatment, or detection of nanostructure with scanning probe
    • Y10S977/86Scanning probe structure

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP61032068A 1985-03-22 1986-02-18 電子顕微鏡 Granted JPS61220260A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US715139 1985-03-22
US06/715,139 US4618767A (en) 1985-03-22 1985-03-22 Low-energy scanning transmission electron microscope

Publications (2)

Publication Number Publication Date
JPS61220260A true JPS61220260A (ja) 1986-09-30
JPH0453070B2 JPH0453070B2 (en]) 1992-08-25

Family

ID=24872814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61032068A Granted JPS61220260A (ja) 1985-03-22 1986-02-18 電子顕微鏡

Country Status (5)

Country Link
US (1) US4618767A (en])
EP (1) EP0195349B1 (en])
JP (1) JPS61220260A (en])
CA (1) CA1223678A (en])
DE (1) DE3681051D1 (en])

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008052946A (ja) * 2006-08-23 2008-03-06 Jeol Ltd ビーム応用装置

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3570012D1 (en) * 1985-01-29 1989-06-08 Ibm Field-emission scanning auger electron microscope
USRE33387E (en) * 1985-11-26 1990-10-16 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4724318A (en) * 1985-11-26 1988-02-09 International Business Machines Corporation Atomic force microscope and method for imaging surfaces with atomic resolution
US4788426A (en) * 1986-06-11 1988-11-29 Kuehnle Manfred R Interactive image recording method and means
US4798989A (en) * 1986-09-26 1989-01-17 Research Development Corporation Scanning tunneling microscope installed in electron microscope
EP0290522B1 (de) * 1986-11-24 1991-03-27 Lasarray Holding Ag Vorrichtung zur erzeugung und detektion von magnetischen materialstrukturen im bereich atomarer dimensionen
EP0551964B1 (en) * 1986-12-24 1998-04-01 Canon Kabushiki Kaisha Recording and reproducing device
DE3771711D1 (de) * 1987-05-12 1991-08-29 Ibm Atomares kraeftemikroskop mit oscillierendem quarz.
JPH0820246B2 (ja) * 1987-08-12 1996-03-04 オリンパス光学工業株式会社 走査型プローブ顕微鏡
DE3854173T2 (de) * 1987-08-25 1995-11-30 Canon Kk Codiereinrichtung.
EP0307210A3 (en) * 1987-09-10 1991-05-15 Seiko Instruments Inc. Memory writing apparatus
EP0307211A3 (en) * 1987-09-10 1991-05-15 Seiko Instruments Inc. Memory reading device
US5315247A (en) * 1987-11-09 1994-05-24 California Institute Of Technology Method and apparatus for measuring a magnetic field using a deflectable energized loop and a tunneling tip
US5293781A (en) * 1987-11-09 1994-03-15 California Institute Of Technology Tunnel effect measuring systems and particle detectors
US5265470A (en) * 1987-11-09 1993-11-30 California Institute Of Technology Tunnel effect measuring systems and particle detectors
US4823004A (en) * 1987-11-24 1989-04-18 California Institute Of Technology Tunnel and field effect carrier ballistics
JP2936545B2 (ja) * 1988-06-24 1999-08-23 株式会社日立製作所 走査プローブ顕微鏡
US5009111A (en) * 1988-08-31 1991-04-23 Quanscan, Inc. Differential force balance apparatus
JP2834173B2 (ja) * 1989-02-17 1998-12-09 株式会社日立製作所 走査型トンネル音響顕微鏡
JP2686645B2 (ja) * 1989-05-08 1997-12-08 キヤノン株式会社 走査型トンネル電流検出装置
US5229606A (en) * 1989-06-05 1993-07-20 Digital Instruments, Inc. Jumping probe microscope
US5266801A (en) * 1989-06-05 1993-11-30 Digital Instruments, Inc. Jumping probe microscope
US5237859A (en) * 1989-12-08 1993-08-24 Digital Instruments, Inc. Atomic force microscope
US5224376A (en) * 1989-12-08 1993-07-06 Digital Instruments, Inc. Atomic force microscope
DE4030242A1 (de) * 1990-09-25 1992-04-02 Raith Gmbh Vakuum-korpuskularstrahlgeraete
JPH0756443B2 (ja) * 1990-12-20 1995-06-14 株式会社島津製作所 生体試料観察用走査型トンネル顕微鏡
KR940007963A (ko) * 1992-09-03 1994-04-28 오오가 노리오 판그물 및 투과형 전자현미경용 시료의 연마방법
JP3270165B2 (ja) * 1993-01-22 2002-04-02 セイコーインスツルメンツ株式会社 表面分析及び加工装置
JP2983876B2 (ja) * 1994-03-22 1999-11-29 徹雄 大原 リアルタイムかつナノメータスケールの位置測定方法および装置
JPH08313544A (ja) * 1995-05-24 1996-11-29 Hitachi Ltd 電子顕微鏡及びこれを用いた試料観察方法
US6198299B1 (en) * 1998-08-27 2001-03-06 The Micromanipulator Company, Inc. High Resolution analytical probe station
US6744268B2 (en) * 1998-08-27 2004-06-01 The Micromanipulator Company, Inc. High resolution analytical probe station
US7759949B2 (en) 2004-05-21 2010-07-20 Microprobe, Inc. Probes with self-cleaning blunt skates for contacting conductive pads
US9097740B2 (en) 2004-05-21 2015-08-04 Formfactor, Inc. Layered probes with core
US8988091B2 (en) 2004-05-21 2015-03-24 Microprobe, Inc. Multiple contact probes
US9476911B2 (en) 2004-05-21 2016-10-25 Microprobe, Inc. Probes with high current carrying capability and laser machining methods
USRE43503E1 (en) 2006-06-29 2012-07-10 Microprobe, Inc. Probe skates for electrical testing of convex pad topologies
US7659739B2 (en) 2006-09-14 2010-02-09 Micro Porbe, Inc. Knee probe having reduced thickness section for control of scrub motion
US7733101B2 (en) 2004-05-21 2010-06-08 Microprobe, Inc. Knee probe having increased scrub motion
US7649367B2 (en) 2005-12-07 2010-01-19 Microprobe, Inc. Low profile probe having improved mechanical scrub and reduced contact inductance
US7312617B2 (en) 2006-03-20 2007-12-25 Microprobe, Inc. Space transformers employing wire bonds for interconnections with fine pitch contacts
US7488950B2 (en) * 2006-06-05 2009-02-10 Blaise Laurent Mouttet Crosswire sensor
US7786740B2 (en) 2006-10-11 2010-08-31 Astria Semiconductor Holdings, Inc. Probe cards employing probes having retaining portions for potting in a potting region
US8907689B2 (en) 2006-10-11 2014-12-09 Microprobe, Inc. Probe retention arrangement
US7514948B2 (en) 2007-04-10 2009-04-07 Microprobe, Inc. Vertical probe array arranged to provide space transformation
US8723546B2 (en) 2007-10-19 2014-05-13 Microprobe, Inc. Vertical guided layered probe
US7671610B2 (en) 2007-10-19 2010-03-02 Microprobe, Inc. Vertical guided probe array providing sideways scrub motion
US8230593B2 (en) 2008-05-29 2012-07-31 Microprobe, Inc. Probe bonding method having improved control of bonding material
US8586923B1 (en) * 2012-06-21 2013-11-19 International Business Machines Corporation Low-voltage transmission electron microscopy
US9552961B2 (en) * 2015-04-10 2017-01-24 International Business Machines Corporation Scanning transmission electron microscope having multiple beams and post-detection image correction

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2711536A1 (de) * 1977-03-14 1978-09-21 Siemens Ag Durchstrahlungs-raster-korpuskularstrahlmikroskop
CH643397A5 (de) * 1979-09-20 1984-05-30 Ibm Raster-tunnelmikroskop.
US4550257A (en) * 1984-06-29 1985-10-29 International Business Machines Corporation Narrow line width pattern fabrication

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008052946A (ja) * 2006-08-23 2008-03-06 Jeol Ltd ビーム応用装置

Also Published As

Publication number Publication date
EP0195349A3 (en) 1988-07-27
US4618767A (en) 1986-10-21
JPH0453070B2 (en]) 1992-08-25
EP0195349B1 (en) 1991-08-28
CA1223678A (en) 1987-06-30
DE3681051D1 (de) 1991-10-02
EP0195349A2 (en) 1986-09-24

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